ToF-SIMS enables precise determination of elemental, isotopic or molecular composition at the extreme surface of samples (<1 nm depth) by mass spectrometry. Thanks to its high spatial resolution (50nm) and high sensitivity (down to ppm), it provides detailed analysis of the surface of polymeric, ceramic, metallic or semiconductor materials.
Molecular information from ToF-SIMS is used to determine the family of organic compounds, or even to identify certain molecules (contaminants, additives, etc.) present on the surface, even in minute quantities (monomolecular layer).
In addition to high-precision surface analysis, the equipment is equipped with several profiling guns used to produce in-depth compositional profiles over several microns in most materials.
By combining the use of the FIB (Focused Ion Beam) and the high-resolution nanoprobe (50nm), it is possible to analyze the surface of rough samples and produce highly accurate 3D chemical maps.

These features make it an essential instrument for studying today's advanced materials, and for meeting your needs for characterization and failure resolution in a wide range of application fields, such as :

- Determining the origin of an adhesion problem or defect on a coating,

- Identifying surface or interface pollution,

- Validating the surface (bio)functionalization of an implant or sensor,

- Characterizing a stack of micro/nano layers,

- Chemical mapping of coatings, tablets, composite matrices, etc.

Our strengths:

  • Lateral resolution down to 50 nm,
  • Profiling of inorganic materials, even hard ones,
  • Argon aggregate profiling of organic materials (GCIB) down to 20 µm,
  • Oxygen aggregate profiling of complex inorganic materials,
  • Combine FIB (Focused Ion Beam) with 50nm resolution to analyze rough samples and produce 3D chemical maps,
  • Sample can be heated or cooled (from -150°C to +600°C)